Effects of gate work function on E-mode AlGaN/GaN HEMTs with stack gate β-Ga2O3/p-GaN structure
نویسندگان
چکیده
This research investigates electrical properties of E-mode AlGaN/GaN HEMTs with n-type β-Ga2O3/p-GaN gate stack under different work functions 4.6, 5.1 and 5.7 eV, respectively. The simulated results show that the device function eV exhibits largest threshold voltage 2.8 V while having lowest saturation drain current 0.15 A mm−1, which can be ascribed to highest Schottky barrier, leading least electrons collected at interface. Moreover, shows breakdown as well off-state leakage, attributed strength electric field in Ga2O3 layer. Additionally, Fowler–Nordheim equation was used study mechanisms leakage.
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ژورنال
عنوان ژورنال: Journal of Physics D
سال: 2021
ISSN: ['1361-6463', '0022-3727']
DOI: https://doi.org/10.1088/1361-6463/ac0a0b